direkt zum Inhalt springen

direkt zum Hauptnavigationsmenü

Sie sind hier

TU Berlin

Inhalt des Dokuments

Publikationssuche

Suche nach Publikationen




Puplikationen in Fachjournalen

Tuning Thermal Transport in Ultrathin Silicon Membranes by Surface Nanoscale Engineering
Zitatschlüssel Neogi2015
Autor Neogi, Sanghamitra and Reparaz, J. Sebastian and Pereira, Luiz Felipe C. and Graczykowski, Bartlomiej and Wagner, Markus R. and Sledzinska, Marianna and Shchepetov, Andrey and Prunnila, Mika and Ahopelto, Jouni and Sotomayor-Torres, Clivia M. and Donadio, Davide
Seiten 3820
Jahr 2015
ISBN 1936-0851
ISSN 1936086X
DOI 10.1021/nn506792d
Journal ACS Nano
Jahrgang 9
Nummer 4
Monat apr
Verlag American Chemical Society
Zusammenfassung A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively. A detailed understanding of the connections of fabrication and processing to structural and thermal properties of low-dimensional nanostructures is essential to design materials and devices for phononics, nanoscale thermal management, and thermoelectric applications. Silicon provides an ideal platform to study the relations between structure and heat transport since its thermal conductivity can be tuned over 2 orders of magnitude by nanostructuring. Combining realistic atomistic modeling and experiments, we unravel the origin of the thermal conductivity reduction in ultrathin suspended silicon membranes, down to a thickness of 4 nm. Heat transport is mostly controlled by surface scattering: rough layers of native oxide at surfaces limit the mean free path of thermal phonons below 100 nm. Removing the oxide layers by chemical processing allows us to tune the thermal conductivity over 1 order of magnitude. Our results guide materials design for future phononic applications, setting the length scale at which nanostructuring affects thermal phonons most effectively.
Link zur Publikation Download Bibtex Eintrag

Zusatzinformationen / Extras

Direktzugang

Schnellnavigation zur Seite über Nummerneingabe

Diese Seite verwendet Matomo für anonymisierte Webanalysen. Mehr Informationen und Opt-Out-Möglichkeiten unter Datenschutz.