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Silicide thin films
Silicides of the rare earths, such as Tb, Dy, or Er, are known to form a variety of two-dimensional epitaxial layers on Si(111). Such film structures can be prepared by deposition of thin rare earth films on clean Si surfaces and thermal treatment. Depending on the rare earth coverage, submonolayer, monolayer and multilayer silicide structures are formed [1,2]. The monolayer and multilayer films consist of hexagonal silicides and are characterized by a two-dimensional metallicity [3].
This work is currently supported by FOR 1282 project D and FOR1700 project E2 of the Deutsche Forschungsgemeinschaft.
[1] Terbium induced nanostructures on Si(111), M. Franz, J. Große, R. Kohlhaas, and M. Dähne, Surf. Sci. 637-638, 149 (2015).
[2] Atomic structure of thin dysprosium-silicide layers on Si(111), I. Engelhardt, C. Preinesberger, S.K. Becker, H. Eisele, and M. Dähne, Surf. Sci. 600, 755 (2006).
[3] Energy surfaces of rare-earth silicide films on Si(111), M. Wanke, M. Franz, M. Vetterlein, G. Pruskil, B. Höpfner, C. Prohl, I. Engelhardt, P. Stojanov, E. Huwald, J. Riley, and M. Dähne, Surf. Sci. 603, 2808 (2009).